WIRBELEIT, Frank. Arsenic diffusivity study by comparison of post-Surface and post-implant diffusion in silicon with Local Density Diffusion (LDD-) model approximation. Diffusion Fundamentals, [S. l.], v. 15, 2011. DOI: 10.62721/diffusion-fundamentals.15.570. Disponível em: https://diffusion.journals.qucosa.de/diffusion/article/view/570. Acesso em: 4 apr. 2025.