YOSHIDA, Masayuki; KITAGAWA, Hajime; MOROOKA, Masami; TANAKA, Shuji. Near equilibrium in dissociative diffusion of nickel in silicon. Diffusion Fundamentals, [S. l.], v. 6, 2007. DOI: 10.62721/diffusion-fundamentals.6.107. Disponível em: https://diffusion.journals.qucosa.de/diffusion/article/view/107. Acesso em: 5 apr. 2025.