KIRYUKHANTSEV-KORNEEV, Ph.V.; KUPTSOV, K.A.; SAGALOVA, T.B.; SHVINDINA, N.V.; BONDAREV, A.V. Diffusion-barrier properties and thermal stability of TiAlSiCN, TiAlSiCN/SiBCN, and TiAlSiCN/AlOx films. Diffusion Fundamentals, [S. l.], v. 30, 2017. DOI: 10.62721/diffusion-fundamentals.30.1027. Disponível em: https://diffusion.journals.qucosa.de/diffusion/article/view/1027. Acesso em: 4 apr. 2025.