Effect of Ge addition in the thermal stability and microstructure Ag/Ge/AlN nano-multilayer system

Authors

  • E. Klyatskina
  • C. Cancellieri
  • M. Chodi
  • L. Jeurgens
  • B. Straumal
  • J. Janczak-Rusch

DOI:

https://doi.org/10.62721/diffusion-fundamentals.30.995

Keywords:

nano-multilayer system, temperature, microstructure

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Published

2017-12-01

How to Cite

Klyatskina, E., Cancellieri, C., Chodi, M., Jeurgens, L., Straumal, B., & Janczak-Rusch, J. (2017). Effect of Ge addition in the thermal stability and microstructure Ag/Ge/AlN nano-multilayer system. Diffusion Fundamentals, 30. https://doi.org/10.62721/diffusion-fundamentals.30.995

Issue

Vol. 30 (2017): Special Issue "Diffusion Fundamentals VII"

Section

Extended Abstracts

URN

http://nbn-resolving.org/urn:nbn:de:bsz:15-qucosa2-317318

License

Copyright (c) 2017 The author(s)

Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 International License.